Overview
The MatMeas High-Purity Quartz Crucible is engineered for precision single crystal growth applications in semiconductor wafer and solar photovoltaic manufacturing.
Constructed from premium fused silica (SiO₂ >99.99%), our crucibles offer exceptional thermal shock resistance and maintain structural integrity under extreme temperatures up to 1500°C. The low aluminum and alkali metal content minimizes contamination risks during silicon ingot pulling processes.
Available in both transparent and opaque configurations, with customizable dimensions to fit mainstream crystal pullers (CGS, Kayex, etc.). OEM/ODM services available for wholesale orders.
Specifications
| Material Composition | High-Purity Fused Quartz SiO₂ |
| Purity Level | >99.99% (SiO₂ content) |
| Aluminum Content | <15 ppm |
| Alkali Metals (Na, K, Li) | <2 ppm |
| Maximum Working Temperature | 1500°C (short term: 1600°C) |
| Softening Point | ~1650°C |
| Density | 2.07-2.21 g/cm³ |
| Thermal Expansion Coefficient | 5.5 × 10⁻⁷ /°C (20-300°C) |
| Available Types | Transparent / Opaque / Coated |
| Standard Dimensions | 12" - 40" diameter (customizable) |
| Wall Thickness | 5 - 15 mm (customizable) |
| Applications | CZ Silicon Pulling, LED Sapphire, Optical Fiber |
| Packaging | Cleanroom vacuum packaging |
Applications
- Semiconductor Silicon Ingot
CZ (Czochralski) method single crystal silicon growth for IC chips - Solar Photovoltaic Industry
Polysilicon ingot pulling for solar cells - LED Manufacturing
Sapphire crystal growth substrates - Optical Fiber Preform
High purity glass preform production - Rare Earth Materials
High melting point metal refining - Laboratory Applications
High temperature chemical analysis and materials research